Plasma Cleaner

Process Chamber

• Plasma Mode : PE (Plasma Etching) Mode with single electrode
• Size : 200×220×160 (W×D×H, mm)
• Single Block Aluminum (Not welded, Minimized gas leak)
• Uniform gas flow design (Patent No. 10-1697205)

Generator

• Frequency : 20~100kHz (10kHz increment)
• Power : Max. 200W (Adjustable in 1W increment)
• (Opt.) RF(13.56MHz) with Max. 300W
• Automatic Impedance Matching
• Process Monitoring and Control

 Gas flow module

• Maximum Number of gas channels : × 4 lines
• Gas flow control : High repeatability MFC
• Purge line : × 1 ea
• Vent line : × 1 ea
• MFC Flow rate : Max.200 sccm (1 sccm increment)

Vacuum Package

• Gauge : Pirani (5×10^-4 Torr)
• Pump : Oil Rotary Pump
• Pump displacement : 290L/min @ 60Hz
• Ultimate Pressure : 5×10^-3 Torr

 Controller

• DSP on board signal controller
• Automatic / Manual operation
• Interactive integrated software
• 7” Touchscreen PC & USB data transfer
• Saving and loading of process recipes
• Process graphs and alarm log loading

System Dimension

• Main System : 510×525×640 (W×D×H, mm)
• Vacuum Pump : 480×160×250 (W×D×H, mm)