Overview
Process Chamber
- Plasma Mode : PE (Plasma Etching) Mode with single electrode
- Size : 140×200×110 (W×D×H, mm)
- Single Block Aluminum (Not welded, Minimized gas leak)
- Uniform gas flow design (Patent No. 10-1697205)
Generator
- Frequency : 20~100kHz (10kHz increment)
- Power: Max. 100W (Adjustable in 1W increment)
- Automatic Impedance Matching
- Process Monitoring and Control
Gas flow module
- Maximum Number of gas channels : ×3 lines
- Gas flow control : High repeatability MFC
- Purge line : ×1 ea
- Vent line : ×1 ea
- MFC Flow rate : Max.100 sccm (1 sccm increment)
Controller
- DSP on board signal controller
- Automatic / Manual operation
- Interactive integrated software
- 7” Touchscreen PC & USB data transfer
- Saving and loading of process recipes
- Process graphs and alarm log loading







