Atomic Force Microscope

Park NX-Mask is the new generation photomask repair system that addresses the latest challenges of shrinking device geometries and increasing photomask complexities. Park NX-Mask is an innovative tool for the repair of high-end EUV Mask incorporating advanced atomic force microscopy technology. It provides all in one solution from auto defect review to repair of defects to verification of the repair, accelerating the throughput at unprecedented repair efficacy.

• No risk of damage and seamless repair of any type of defects
• Compatible with a dual pod for handling EUV masks
• All-in-one solution for locating defects and post-repair verification