Spin Coater POLOS300 Advanced
The POLOS Advanced 300 spin coater is suitable for processing fragments of Ø300mm/12 inch wafers (or Ø360mm substrates), or 8"x8" square substrates.
Overview
- Automatic Chemical Dispense:
- Dispensing fluids through up to 6 spray nozzles
- Each programmable for sequential or parallel dispense
- Clear/Transparant Domed ECTFE Lid with central integrated N2 shower purge
- Available in:
- Seamless Full-Plastic Housing in Natural Polypropylene (NPP)
- Seamless Full-Plastic Housing in High Chemical Resistant PTFE (TFM)
- Table Top spin coater Model: dimensions: 43cm (w) x 65cm (d) x 31cm (h)
- Substrate wafer size: fragments and substrates up to Ø360mm or 8"x8"
- Heavy-Duty Servo-Controlled Motor:
- Assuring repeatable rpm rates
- Rotation Speed Adjustable 1 to 10.000 rpm
- Clockwise and Counterclockwise Rotation
- Puddle function for developer purposes
- Easy, step by step Programming via Gloved-Finger-Friendly, Full-Size Keyboard with LED Backlit Display
- Programmable Digital Process Controller:
- Storage of multiple programs of 99 Step Recipes each, for:
- Speed 1-10.000rpm, Time, Acceleration
- Vacuum On/Off
- Relay Open/Close
- Multi-User Access Levels
- Storage of multiple programs of 99 Step Recipes each, for:
- 2 Programmable ON/OFF Switching Outputs
e.g. for Dispense On/Off, Nitrogen On/Off, etc. - Drain connection
- CE-approved





