Spin Coater

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Spin Coater POLOS300 Advanced

The POLOS Advanced 300 spin coater is suitable for processing fragments of Ø300mm/12 inch wafers (or Ø360mm substrates), or 8"x8" square substrates.

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Overview

  • Automatic Chemical Dispense:
    • Dispensing fluids through up to 6 spray nozzles
    • Each programmable for sequential or parallel dispense
  • Clear/Transparant Domed ECTFE Lid with central integrated N2 shower purge
  • Available in:
    • Seamless Full-Plastic Housing in Natural Polypropylene (NPP)
    • Seamless Full-Plastic Housing in High Chemical Resistant PTFE (TFM)
  • Table Top spin coater Model: dimensions: 43cm (w) x 65cm (d) x 31cm (h)
  • Substrate wafer size: fragments and substrates up to Ø360mm or 8"x8"
  • Heavy-Duty Servo-Controlled Motor:
    • Assuring repeatable rpm rates
    • Rotation Speed Adjustable 1 to 10.000 rpm
    • Clockwise and Counterclockwise Rotation
    • Puddle function for developer purposes
  • Easy, step by step Programming via Gloved-Finger-Friendly, Full-Size Keyboard with LED Backlit Display
  • Programmable Digital Process Controller:
    • Storage of multiple programs of 99 Step Recipes each, for:
      • Speed 1-10.000rpm, Time, Acceleration
      • Vacuum On/Off
      • Relay Open/Close
      • Multi-User Access Levels
  • 2 Programmable ON/OFF Switching Outputs
    e.g. for Dispense On/Off, Nitrogen On/Off, etc.
  • Drain connection
  • CE-approved