Spin Coater

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Spin Coater SPIN200i-NPP

200mm Single Substrate Spin Processor

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Overview

The POLOS SPIN200i is a versatile and high-quality substrate spin coater. It is specifically designed for R&D and low volume production. An aerodynamically efficient chamber enhances uniformity, while the natural polypropylene or PTFE construction ensures a metal-free, contamination-free process area that is easy to clean. Desktop version for manual or automated (optional) chemical dispense.

Suitable for Coating, Cleaning, Rinse/Dry, Developing, Etching, PDMI, and other processes

Features:

  • Easy, step- by- step recipe programming via large color touchscreen
  • Transparent Lid with syringe holder for central dispensing
  • Electro-magnetic safety lid lock
  • N2 diffuser for N2 purge during process
  • High Acceleration and Accuracy
  • Manual Chemical Dispense
  • CW & CCW Rotation
  • (Detachable) Color Touchscreen with Customizable Icons
  • Unlimited Program Storage for recipes with multiple steps each
  • USB Port

Including

  • 1 x A-V87-S96-NPP-HD Vacuum Chuck
  • 1 x D-V10-S50-NPP-HD Fragment Adapter