Rapid Nano-Patterning

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UV Nanoimprint System EZI PL400/600

EZImprinting is a super-high yield (> 99 %) nanoimprint lithography platform with sub-10 nm resolution and one-step Auto Release™ function.

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Overview

Advantages of the PL400/600 Nanoimprint Systems:

  • Full-wafer imprinting – 6 inch PL600, 4 inch PL400

  • Sub-10 nm resolution with 99% yield

  • One step auto-release function preventing mold/substrate damage

  • Supports both hard and soft molds of various types

  • Variable mold and substrate sizes

  • Programmable PLC with touch-screen user interface