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Deposition Techniques

HomeProductsMaterial Science & NanotechnologyDeposition TechniquesSpin Coater

Spin Coater

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Spin Coater POLOS200 Advanced

Spin Coater POLOS200 Advanced

POLOS Advanced 200 are suitable for processing fragments of Ø 200 mm / 8 inch wafers (or Ø 260 mm substrates), or 6"x6" square substrates.

Spin Coater POLOS300 Advanced

Spin Coater POLOS300 Advanced

The POLOS Advanced 300 spin coater is suitable for processing fragments of Ø300mm/12 inch wafers (or Ø360mm substrates), or 8"x8" square substrates.

Spin Coater SPIN200i-NPP

Spin Coater SPIN200i-NPP

200mm Single Substrate Spin Processor

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No 60, Jalan Puteri 5/5, Bandar Puteri 47100 Puchong, Selangor Malaysia

+603 8065 3889 +603 8065 3989info@gaiascience.com.my

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