Material Characterisation

The EP4, our latest generation of imaging ellipsometers, combines ellipsometry and microscopy. This enables the characterization of thickness and refractive index with the sensitivity of ellipsometry on micro-structures as small as 1 µm.

The i4 is a state-of-the-art active vibration isolation system. It is ideal for isolating high-resolution measurement equipment from building vibrations and other disturbances, while providing active compensation in all six degrees of freedom.

Compact film thickness monitor is a small and highly accurate reflective spectroscopic film thickness meter that uses a reflective probe with excellent optical properties. It also can be used as an in-line monitoe during the process or as an end-point detection sensor.

Automatic mapping film thickness measurement over the entire surface of wafers up to 300 mm.