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Material Science & Nanotechnology
Atomic Layer Deposition
SAL3000 Atomic Layer Deposition Equipment
A space saving ALD equipment with substantial functions that is suitable for R&D and laboratory use to realize the precise step coverage deposition for uniform coating of each atomic layers.
Brand: Agus
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Warranty Details
- Selectable deposition direction: SAL3000D – Deposition DOWN; SAL3000U – Deposition UP
- Deposition distribution with higher quality
- Load Lock Chamber for automated substrate feeding
- Glove Box for vacuum replacement can be selected
- Easy to use program
- All in one design
- Abundant connection ports for precursor bottles
- Dry pump
Specification :
| Equipment Dimensions (W x D x H) | 835 x 700 x 1644 mm |
| Precursor | 4 lines (Max 6 lines) |
| Uniformity | ?±3% |
| Substrate Heater | 350°C (800°C) |
| Combination | O |
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