All Products of Deposition Techniques

THERMO-CUTE 2D-Graphene CVD System

THERMO-CUTE 2D-Graphene CVD System

Chemical Vapor Deposition Graphene System THERMO-CUTE
SSP1000 Atomic Layer Deposition Equipment

SSP1000 Atomic Layer Deposition Equipment

Affordable desktop type RF sputtering equipment with changeable deposition direction.
SEV2000Plus Vapor Deposition Equipment

SEV2000Plus Vapor Deposition Equipment

Small evaporation system for R&D, for the deposition of metal films and oxide films by using an EB gun and resistance heating evaporation sources.
SAL3000 Atomic Layer Deposition Equipment

SAL3000 Atomic Layer Deposition Equipment

A space saving ALD equipment with substantial functions that is suitable for R&D and laboratory use to realize the precise step coverage deposition for uniform coating of each atomic layers.
SAL1000 Atomic Layer Deposition Equipment

SAL1000 Atomic Layer Deposition Equipment

An affordable ALD equipment that is suitable for R&D and laboratory use to realize the precise step coverage deposition for uniform coating of each atomic layers.
Electron Beam Evaporation System NEE-4000

Electron Beam Evaporation System NEE-4000

NANO-MASTER offers combinatorial evaporation system using substrate masking and computer controlled evaporation rates for individual e-beam evaporators
Benchtop Inkjet Printer PiXDRO LP50

Benchtop Inkjet Printer PiXDRO LP50

The PiXDRO LP50 is designed for research and development of inkjet processes and applications
Sputtering System NSC-4000

Sputtering System NSC-4000

Sputter Coater with auto load/unload sputter-up configuration
TableTop PA-MOCVD Systems NMC-3000

TableTop PA-MOCVD Systems NMC-3000

NANO-MASTER has developed the world's first table top Plasma Assisted Metal Organic Chemical Vapor Deposition (PA-MOCVD) system for GaN, InGaN and AlGaN deposition processes. In this unique system, having a plasma source N2 is use...
PECVD Systems NPE-4000

PECVD Systems NPE-4000

NANO-MASTER's PECVD systems are capable of depositing high quality SiO2, Si3N4, CNT, DLC or SiC films. Depending on application, RF showerhead, Hollow Cathode, ICP or Microwave plasma sources can be used. The platen can accomodate...
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