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Deposition Techniques
Chemical Vapor Deposition
PECVD Systems NPE-4000
NANO-MASTER's PECVD systems are capable of depositing high quality SiO2, Si3N4, CNT, DLC or SiC films. Depending on application, RF showerhead, Hollow Cathode, ICP or Microwave plasma sources can be used. The platen can accomodate...
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TableTop PA-MOCVD Systems NMC-3000
NANO-MASTER has developed the world's first table top Plasma Assisted Metal Organic Chemical Vapor Deposition (PA-MOCVD) system for GaN, InGaN and AlGaN deposition processes. In this unique system, having a plasma source N2 is use...
THERMO-CUTE 2D-Graphene CVD System
Chemical Vapor Deposition Graphene System THERMO-CUTE
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