TableTop PA-MOCVD Systems NMC-3000
NANO-MASTER has developed the world's first table top Plasma Assisted Metal Organic Chemical Vapor Deposition (PA-MOCVD) system for GaN, InGaN and AlGaN deposition processes. In this unique system, having a plasma source N2 is used instead of NH3 for growing nitrides thus eliminating abatment of NH3 and lowering H2 content in the films. Plasma enhancement via RF showerhead plasma source also allows lower deposition temperatures (600°C versus 1100°C) making it possible to offer this process in a table top system.
Brand: Nanomaster Inc